Coverart for item
The Resource Submicron lithography, Phillip D. Blais, chairman/editor ; in cooperation with the International Society for Hybrid Microelectronics, the Northern California Microphotomask/Masking Working Group, the Materials Research Socity, March 29-30, 1982, Santa Clara, California

Submicron lithography, Phillip D. Blais, chairman/editor ; in cooperation with the International Society for Hybrid Microelectronics, the Northern California Microphotomask/Masking Working Group, the Materials Research Socity, March 29-30, 1982, Santa Clara, California

Label
Submicron lithography
Title
Submicron lithography
Statement of responsibility
Phillip D. Blais, chairman/editor ; in cooperation with the International Society for Hybrid Microelectronics, the Northern California Microphotomask/Masking Working Group, the Materials Research Socity, March 29-30, 1982, Santa Clara, California
Contributor
Subject
Genre
Member of
Series statement
Proceedings of SPIE--the International Society for Optical Engineering
Series volume
v. 333
Submicron lithography, Phillip D. Blais, chairman/editor ; in cooperation with the International Society for Hybrid Microelectronics, the Northern California Microphotomask/Masking Working Group, the Materials Research Socity, March 29-30, 1982, Santa Clara, California
Label
Submicron lithography, Phillip D. Blais, chairman/editor ; in cooperation with the International Society for Hybrid Microelectronics, the Northern California Microphotomask/Masking Working Group, the Materials Research Socity, March 29-30, 1982, Santa Clara, California
Publication
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Bibliography note
Includes bibliographical references and indexes
Dimensions
28 cm.
http://library.link/vocab/discovery_link
{'f': 'http://opac.lib.rpi.edu/record=b1146235'}
Extent
viii, 179 p.
Other physical details
ill.
Reproduction note
Photocopy.

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