Coverart for item
The Resource Optical microlithography XIV : 27 February-2 March, 2001, Santa Clara, [California], USA, Christopher J. Progler, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH

Optical microlithography XIV : 27 February-2 March, 2001, Santa Clara, [California], USA, Christopher J. Progler, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH

Label
Optical microlithography XIV : 27 February-2 March, 2001, Santa Clara, [California], USA
Title
Optical microlithography XIV
Title remainder
27 February-2 March, 2001, Santa Clara, [California], USA
Statement of responsibility
Christopher J. Progler, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH
Title variation
Optical microlithography 14
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
NAT
Illustrations
illustrations
Index
index present
Literary form
non fiction
Nature of contents
bibliography
Series statement
SPIE proceedings series, 0277-786X
Series volume
v. 4346
Optical microlithography XIV : 27 February-2 March, 2001, Santa Clara, [California], USA, Christopher J. Progler, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH
Label
Optical microlithography XIV : 27 February-2 March, 2001, Santa Clara, [California], USA, Christopher J. Progler, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH
Publication
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Bibliography note
Includes bibliographic references and author index
http://library.link/vocab/cover_art
https://contentcafe2.btol.com/ContentCafe/Jacket.aspx?Return=1&Type=S&Value=9780819440327&userID=ebsco-test&password=ebsco-test
Dimensions
28 cm.
http://library.link/vocab/discovery_link
{'f': 'http://opac.lib.rpi.edu/record=b1404038'}
Extent
2 v. (xxxi, 1652 p.)
Isbn
9780819440327
Lccn
2001279094
Other physical details
ill.

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