Coverart for item
The Resource Optical microlithography II : technology for the 1980s : March 16-17, 1983, Santa Clara, California, Harry L. Stover, chairman/editor ; sponsored by SPIE--the International Society for Optical Engineering, in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working Group

Optical microlithography II : technology for the 1980s : March 16-17, 1983, Santa Clara, California, Harry L. Stover, chairman/editor ; sponsored by SPIE--the International Society for Optical Engineering, in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working Group

Label
Optical microlithography II : technology for the 1980s : March 16-17, 1983, Santa Clara, California
Title
Optical microlithography II
Title remainder
technology for the 1980s : March 16-17, 1983, Santa Clara, California
Statement of responsibility
Harry L. Stover, chairman/editor ; sponsored by SPIE--the International Society for Optical Engineering, in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working Group
Title variation
Optical microlithography 2
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Subject
Genre
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Series statement
Proceedings of SPIE--the International Society for Optical Engineering
Series volume
v. 394
Optical microlithography II : technology for the 1980s : March 16-17, 1983, Santa Clara, California, Harry L. Stover, chairman/editor ; sponsored by SPIE--the International Society for Optical Engineering, in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working Group
Label
Optical microlithography II : technology for the 1980s : March 16-17, 1983, Santa Clara, California, Harry L. Stover, chairman/editor ; sponsored by SPIE--the International Society for Optical Engineering, in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working Group
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Bibliography note
Includes bibliographical references and index
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Dimensions
28 cm.
http://library.link/vocab/discovery_link
{'f': 'http://opac.lib.rpi.edu/record=b1131391'}
Extent
vi, 251 p.
Isbn
9780892524297
Isbn Type
(pbk.)
Lccn
83-50213
Other physical details
ill.

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