Coverart for item
The Resource Multichamber and in-situ processing of electronic materials : 10-11 October 1989, Santa Clara, California, Robert S. Freund, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organzations, Center for Advanced Electronic Materials Processing/North Carolina State University, Engineering Research Center for Plasma-Aided Manufacturing/University of Wisconsin-Madison, SEMATECH

Multichamber and in-situ processing of electronic materials : 10-11 October 1989, Santa Clara, California, Robert S. Freund, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organzations, Center for Advanced Electronic Materials Processing/North Carolina State University, Engineering Research Center for Plasma-Aided Manufacturing/University of Wisconsin-Madison, SEMATECH

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Multichamber and in-situ processing of electronic materials : 10-11 October 1989, Santa Clara, California
Title
Multichamber and in-situ processing of electronic materials
Title remainder
10-11 October 1989, Santa Clara, California
Statement of responsibility
Robert S. Freund, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organzations, Center for Advanced Electronic Materials Processing/North Carolina State University, Engineering Research Center for Plasma-Aided Manufacturing/University of Wisconsin-Madison, SEMATECH
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Series statement
Proceedings / SPIE--the International Society for Optical Engineering
Series volume
v. 1188
Multichamber and in-situ processing of electronic materials : 10-11 October 1989, Santa Clara, California, Robert S. Freund, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organzations, Center for Advanced Electronic Materials Processing/North Carolina State University, Engineering Research Center for Plasma-Aided Manufacturing/University of Wisconsin-Madison, SEMATECH
Label
Multichamber and in-situ processing of electronic materials : 10-11 October 1989, Santa Clara, California, Robert S. Freund, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organzations, Center for Advanced Electronic Materials Processing/North Carolina State University, Engineering Research Center for Plasma-Aided Manufacturing/University of Wisconsin-Madison, SEMATECH
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Includes bibliographical references
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Dimensions
28 cm.
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{'f': 'http://opac.lib.rpi.edu/record=b1195210'}
Extent
vi, 196 p.
Isbn
9780819402240
Lccn
89-43524
Other physical details
ill.

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