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The Resource Monitoring and control of plasma-enhanced processing of semiconductors : 1-2 November 1988, Santa Clara, California, James E. Griffiths, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering

Monitoring and control of plasma-enhanced processing of semiconductors : 1-2 November 1988, Santa Clara, California, James E. Griffiths, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering

Label
Monitoring and control of plasma-enhanced processing of semiconductors : 1-2 November 1988, Santa Clara, California
Title
Monitoring and control of plasma-enhanced processing of semiconductors
Title remainder
1-2 November 1988, Santa Clara, California
Statement of responsibility
James E. Griffiths, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering
Contributor
Subject
Genre
Member of
Series statement
Proceedings / SPIE--the International Society for Optical Engineering
Series volume
v. 1037
Monitoring and control of plasma-enhanced processing of semiconductors : 1-2 November 1988, Santa Clara, California, James E. Griffiths, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering
Label
Monitoring and control of plasma-enhanced processing of semiconductors : 1-2 November 1988, Santa Clara, California, James E. Griffiths, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering
Publication
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Bibliography note
Includes bibliographical references and index
http://library.link/vocab/cover_art
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Dimensions
28 cm.
http://library.link/vocab/discovery_link
{'f': 'http://opac.lib.rpi.edu/record=b1182081'}
Extent
viii, 147 p.
Isbn
9780819400727
Isbn Type
(pbk.) :
Lccn
88-63652
Other physical details
ill.

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