Coverart for item
The Resource Microlithography and metrology in micromachining III : 29-30 September, 1997, Austin, Texas, Craig R. Friedrich, Akira Umeda, chairs/editors ; sponsored by SPIE--the Internatinoal Society for Optical Engineering, SEMI--Semiconductor Equipment and Materials International, NIST--National Institute of Standards and Tecnology ; cooperating organization Solid State Technology ; published by SPIE--the International Society for Optical Engineering

Microlithography and metrology in micromachining III : 29-30 September, 1997, Austin, Texas, Craig R. Friedrich, Akira Umeda, chairs/editors ; sponsored by SPIE--the Internatinoal Society for Optical Engineering, SEMI--Semiconductor Equipment and Materials International, NIST--National Institute of Standards and Tecnology ; cooperating organization Solid State Technology ; published by SPIE--the International Society for Optical Engineering

Label
Microlithography and metrology in micromachining III : 29-30 September, 1997, Austin, Texas
Title
Microlithography and metrology in micromachining III
Title remainder
29-30 September, 1997, Austin, Texas
Statement of responsibility
Craig R. Friedrich, Akira Umeda, chairs/editors ; sponsored by SPIE--the Internatinoal Society for Optical Engineering, SEMI--Semiconductor Equipment and Materials International, NIST--National Institute of Standards and Tecnology ; cooperating organization Solid State Technology ; published by SPIE--the International Society for Optical Engineering
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
LHL
Illustrations
illustrations
Index
index present
Literary form
non fiction
Nature of contents
bibliography
Series statement
Proceedings / SPIE--the International Society for Optical Engineering
Series volume
v. 3225
Microlithography and metrology in micromachining III : 29-30 September, 1997, Austin, Texas, Craig R. Friedrich, Akira Umeda, chairs/editors ; sponsored by SPIE--the Internatinoal Society for Optical Engineering, SEMI--Semiconductor Equipment and Materials International, NIST--National Institute of Standards and Tecnology ; cooperating organization Solid State Technology ; published by SPIE--the International Society for Optical Engineering
Label
Microlithography and metrology in micromachining III : 29-30 September, 1997, Austin, Texas, Craig R. Friedrich, Akira Umeda, chairs/editors ; sponsored by SPIE--the Internatinoal Society for Optical Engineering, SEMI--Semiconductor Equipment and Materials International, NIST--National Institute of Standards and Tecnology ; cooperating organization Solid State Technology ; published by SPIE--the International Society for Optical Engineering
Publication
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Bibliography note
Includes bibliographical references and author index
http://library.link/vocab/cover_art
https://contentcafe2.btol.com/ContentCafe/Jacket.aspx?Return=1&Type=S&Value=9780819426574&userID=ebsco-test&password=ebsco-test
Dimensions
28 cm.
http://library.link/vocab/discovery_link
{'f': 'http://opac.lib.rpi.edu/record=b1340927'}
Extent
vii, 134 p.
Isbn
9780819426574
Other physical details
ill.

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