Coverart for item
The Resource Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, Santa Clara, California, Bhanwar Singh, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] SEMATECH

Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, Santa Clara, California, Bhanwar Singh, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] SEMATECH

Label
Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, Santa Clara, California
Title
Metrology, inspection, and process control for microlithography XII
Title remainder
23-25 February 1998, Santa Clara, California
Statement of responsibility
Bhanwar Singh, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] SEMATECH
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
CU-S
Index
index present
Literary form
non fiction
Nature of contents
bibliography
Series statement
SPIE proceedings series
Series volume
v. 3332
Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, Santa Clara, California, Bhanwar Singh, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] SEMATECH
Label
Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, Santa Clara, California, Bhanwar Singh, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] SEMATECH
Publication
Note
Earlier volumes I-IX entitled: Integrated circuit metrology, inspection, and process control
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Related Location
Related Agents
Related Authorities
Related Subjects
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Bibliography note
Includes bibliographical references and index
http://library.link/vocab/cover_art
https://contentcafe2.btol.com/ContentCafe/Jacket.aspx?Return=1&Type=S&Value=9780819427779&userID=ebsco-test&password=ebsco-test
Dimensions
28 cm.
http://library.link/vocab/discovery_link
{'f': 'http://opac.lib.rpi.edu/record=b1371748'}
Extent
xv, 744 p.
Isbn
9780819427779
Lccn
98226775
Other physical details
ill.

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