Coverart for item
The Resource Metrology, inspection, and process control for microlithography X : 11-13 March, 1996, Santa Clara, California, Susan K. Jones, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH

Metrology, inspection, and process control for microlithography X : 11-13 March, 1996, Santa Clara, California, Susan K. Jones, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH

Label
Metrology, inspection, and process control for microlithography X : 11-13 March, 1996, Santa Clara, California
Title
Metrology, inspection, and process control for microlithography X
Title remainder
11-13 March, 1996, Santa Clara, California
Statement of responsibility
Susan K. Jones, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH
Contributor
Subject
Genre
Language
eng
Member of
Continues
Cataloging source
LHL
Illustrations
illustrations
Index
index present
Literary form
non fiction
Nature of contents
bibliography
Series statement
Proceedings / SPIE--the International Society for Optical Engineering
Series volume
v. 2725
Metrology, inspection, and process control for microlithography X : 11-13 March, 1996, Santa Clara, California, Susan K. Jones, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH
Label
Metrology, inspection, and process control for microlithography X : 11-13 March, 1996, Santa Clara, California, Susan K. Jones, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH
Publication
Note
Previous volumes entitled: Integrated circuit metrology, inspection and process control
Related Contributor
Related Location
Related Agents
Related Authorities
Related Subjects
Related Items
Bibliography note
Includes bibliographical references and author index
http://library.link/vocab/cover_art
https://contentcafe2.btol.com/ContentCafe/Jacket.aspx?Return=1&Type=S&Value=9780819421012&userID=ebsco-test&password=ebsco-test
Dimensions
28 cm.
http://library.link/vocab/discovery_link
{'f': 'http://opac.lib.rpi.edu/record=b1337272'}
Extent
xiii, 802 p.
Isbn
9780819421012
Lccn
95072314
Other physical details
ill.

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