Coverart for item
The Resource Metrology, inspection, and process control for microlithography XIV : 28 February-2 March, 2000, Santa Clara, California, Neal T. Sullivan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH

Metrology, inspection, and process control for microlithography XIV : 28 February-2 March, 2000, Santa Clara, California, Neal T. Sullivan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH

Label
Metrology, inspection, and process control for microlithography XIV : 28 February-2 March, 2000, Santa Clara, California
Title
Metrology, inspection, and process control for microlithography XIV
Title remainder
28 February-2 March, 2000, Santa Clara, California
Statement of responsibility
Neal T. Sullivan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
LHL
Illustrations
illustrations
Index
index present
Literary form
non fiction
Nature of contents
bibliography
Series statement
SPIE proceedings series
Series volume
v. 3998
Metrology, inspection, and process control for microlithography XIV : 28 February-2 March, 2000, Santa Clara, California, Neal T. Sullivan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH
Label
Metrology, inspection, and process control for microlithography XIV : 28 February-2 March, 2000, Santa Clara, California, Neal T. Sullivan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH
Publication
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Bibliography note
Includes bibliographic references and author index
http://library.link/vocab/cover_art
https://contentcafe2.btol.com/ContentCafe/Jacket.aspx?Return=1&Type=S&Value=9780819436160&userID=ebsco-test&password=ebsco-test
Dimensions
28 cm.
http://library.link/vocab/discovery_link
{'f': 'http://opac.lib.rpi.edu/record=b1381675'}
Extent
xiv, 938 p.
Isbn
9780819436160
Other physical details
ill.

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