Coverart for item
The Resource Materials and device characterization in micromachining III : 18-19 September 2000, Santa Clara, USA, Yuli Vladimirsky, Philip J. Coane, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, Solid State Technology, [and] Sandia National Laboratories (USA)

Materials and device characterization in micromachining III : 18-19 September 2000, Santa Clara, USA, Yuli Vladimirsky, Philip J. Coane, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, Solid State Technology, [and] Sandia National Laboratories (USA)

Label
Materials and device characterization in micromachining III : 18-19 September 2000, Santa Clara, USA
Title
Materials and device characterization in micromachining III
Title remainder
18-19 September 2000, Santa Clara, USA
Statement of responsibility
Yuli Vladimirsky, Philip J. Coane, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, Solid State Technology, [and] Sandia National Laboratories (USA)
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Subject
Genre
Language
eng
Member of
Cataloging source
CUS
Index
index present
Literary form
non fiction
Series statement
SPIE proceedings series,
Series volume
v. 4175
Materials and device characterization in micromachining III : 18-19 September 2000, Santa Clara, USA, Yuli Vladimirsky, Philip J. Coane, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, Solid State Technology, [and] Sandia National Laboratories (USA)
Label
Materials and device characterization in micromachining III : 18-19 September 2000, Santa Clara, USA, Yuli Vladimirsky, Philip J. Coane, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, Solid State Technology, [and] Sandia National Laboratories (USA)
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Bibliography note
Includes bibliographical references and author index
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Dimensions
28 cm.
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{'f': 'http://opac.lib.rpi.edu/record=b1389100'}
Extent
ix, 200 p.
Isbn
9780819438317
Other physical details
ill.

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