Coverart for item
The Resource Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK, Chris A. Mack, Tom Stevenson, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cosponsored by Scottish Enterprise (UK) ; cooperating organizations EOS--European Optical Society, IEE--the Institution of Electrical Engineers (UK)

Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK, Chris A. Mack, Tom Stevenson, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cosponsored by Scottish Enterprise (UK) ; cooperating organizations EOS--European Optical Society, IEE--the Institution of Electrical Engineers (UK)

Label
Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK
Title
Lithography for semiconductor manufacturing II
Title remainder
30 May-1 June, 2001, Edinburgh, UK
Statement of responsibility
Chris A. Mack, Tom Stevenson, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cosponsored by Scottish Enterprise (UK) ; cooperating organizations EOS--European Optical Society, IEE--the Institution of Electrical Engineers (UK)
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
LHL
Illustrations
illustrations
Index
index present
Literary form
non fiction
Nature of contents
bibliography
Series statement
Proceedings / SPIE--the International Society for Optical Engineering
Series volume
v. 4404
Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK, Chris A. Mack, Tom Stevenson, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cosponsored by Scottish Enterprise (UK) ; cooperating organizations EOS--European Optical Society, IEE--the Institution of Electrical Engineers (UK)
Label
Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK, Chris A. Mack, Tom Stevenson, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cosponsored by Scottish Enterprise (UK) ; cooperating organizations EOS--European Optical Society, IEE--the Institution of Electrical Engineers (UK)
Publication
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Bibliography note
Includes bibliographic references and author index
http://library.link/vocab/cover_art
https://contentcafe2.btol.com/ContentCafe/Jacket.aspx?Return=1&Type=S&Value=9780819441058&userID=ebsco-test&password=ebsco-test
Dimensions
28 cm.
http://library.link/vocab/discovery_link
{'f': 'http://opac.lib.rpi.edu/record=b1398786'}
Extent
vii, 422 p.
Isbn
9780819441058
Other physical details
ill.

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