Coverart for item
The Resource Lithography for semiconductor manufacturing : 19-21 May, 1999, Edinburgh, Scotland, Chris A. Mack, Tom Stevenson, chairs/editors ; sponsored by EOS--European Optical Society, SPIE--the International Society for Optical Engineering [and] Commission of the European Communities, Directorate General for Science, Research, and Development ; cosponsored by Scottish Enterprise [and] Sira Technology Centre (UK) ; cooperating organization, IEE--the Institution of Electrical Engineers (UK)

Lithography for semiconductor manufacturing : 19-21 May, 1999, Edinburgh, Scotland, Chris A. Mack, Tom Stevenson, chairs/editors ; sponsored by EOS--European Optical Society, SPIE--the International Society for Optical Engineering [and] Commission of the European Communities, Directorate General for Science, Research, and Development ; cosponsored by Scottish Enterprise [and] Sira Technology Centre (UK) ; cooperating organization, IEE--the Institution of Electrical Engineers (UK)

Label
Lithography for semiconductor manufacturing : 19-21 May, 1999, Edinburgh, Scotland
Title
Lithography for semiconductor manufacturing
Title remainder
19-21 May, 1999, Edinburgh, Scotland
Statement of responsibility
Chris A. Mack, Tom Stevenson, chairs/editors ; sponsored by EOS--European Optical Society, SPIE--the International Society for Optical Engineering [and] Commission of the European Communities, Directorate General for Science, Research, and Development ; cosponsored by Scottish Enterprise [and] Sira Technology Centre (UK) ; cooperating organization, IEE--the Institution of Electrical Engineers (UK)
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
LHL
Illustrations
illustrations
Index
index present
Literary form
non fiction
Nature of contents
bibliography
Series statement
Proceedings / SPIE--the International Society for Optical Engineering
Series volume
v. 3741
Lithography for semiconductor manufacturing : 19-21 May, 1999, Edinburgh, Scotland, Chris A. Mack, Tom Stevenson, chairs/editors ; sponsored by EOS--European Optical Society, SPIE--the International Society for Optical Engineering [and] Commission of the European Communities, Directorate General for Science, Research, and Development ; cosponsored by Scottish Enterprise [and] Sira Technology Centre (UK) ; cooperating organization, IEE--the Institution of Electrical Engineers (UK)
Label
Lithography for semiconductor manufacturing : 19-21 May, 1999, Edinburgh, Scotland, Chris A. Mack, Tom Stevenson, chairs/editors ; sponsored by EOS--European Optical Society, SPIE--the International Society for Optical Engineering [and] Commission of the European Communities, Directorate General for Science, Research, and Development ; cosponsored by Scottish Enterprise [and] Sira Technology Centre (UK) ; cooperating organization, IEE--the Institution of Electrical Engineers (UK)
Publication
Related Contributor
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Related Authorities
Related Subjects
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Bibliography note
Includes bibliographic references and author index
http://library.link/vocab/cover_art
https://contentcafe2.btol.com/ContentCafe/Jacket.aspx?Return=1&Type=S&Value=9780819432216&userID=ebsco-test&password=ebsco-test
Dimensions
28 cm.
http://library.link/vocab/discovery_link
{'f': 'http://opac.lib.rpi.edu/record=b1368930'}
Extent
vii, 262 p.
Isbn
9780819432216
Other physical details
ill.

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