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The Resource In-line characterization techniques for performance and yield enhancement in microelectronic manufacturing : 1-2 October 1997, Austin, Texas, Damon K. DeBusk, Sergio Ajuria, chairs/editors ; sponsored and published by SPIE--The International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, Solid State Technology, The Electrochemical Society

In-line characterization techniques for performance and yield enhancement in microelectronic manufacturing : 1-2 October 1997, Austin, Texas, Damon K. DeBusk, Sergio Ajuria, chairs/editors ; sponsored and published by SPIE--The International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, Solid State Technology, The Electrochemical Society

Label
In-line characterization techniques for performance and yield enhancement in microelectronic manufacturing : 1-2 October 1997, Austin, Texas
Title
In-line characterization techniques for performance and yield enhancement in microelectronic manufacturing
Title remainder
1-2 October 1997, Austin, Texas
Statement of responsibility
Damon K. DeBusk, Sergio Ajuria, chairs/editors ; sponsored and published by SPIE--The International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, Solid State Technology, The Electrochemical Society
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
CUS
Illustrations
illustrations
Index
index present
Literary form
non fiction
Nature of contents
bibliography
Series statement
SPIE proceedings series
Series volume
v. 3215
In-line characterization techniques for performance and yield enhancement in microelectronic manufacturing : 1-2 October 1997, Austin, Texas, Damon K. DeBusk, Sergio Ajuria, chairs/editors ; sponsored and published by SPIE--The International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, Solid State Technology, The Electrochemical Society
Label
In-line characterization techniques for performance and yield enhancement in microelectronic manufacturing : 1-2 October 1997, Austin, Texas, Damon K. DeBusk, Sergio Ajuria, chairs/editors ; sponsored and published by SPIE--The International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, Solid State Technology, The Electrochemical Society
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Bibliography note
Includes bibliographical references and index
http://library.link/vocab/cover_art
https://contentcafe2.btol.com/ContentCafe/Jacket.aspx?Return=1&Type=S&Value=9780819426475&userID=ebsco-test&password=ebsco-test
Dimensions
28 cm.
http://library.link/vocab/discovery_link
{'f': 'http://opac.lib.rpi.edu/record=b1340956'}
Extent
v, 186 p.
Isbn
9780819426475
Other physical details
ill.

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