Coverart for item
The Resource Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA, Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH

Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA, Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH

Label
Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA
Title
Emerging lithographic technologies V
Title remainder
27 February-1 March, 2001, Santa Clara, [California], USA
Statement of responsibility
Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH
Title variation
Emerging lithographic technologies 5
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
LHL
Illustrations
illustrations
Index
index present
Literary form
non fiction
Nature of contents
bibliography
Series statement
Proceedings of SPIE
Series volume
v. 4343
Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA, Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH
Label
Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA, Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH
Publication
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Bibliography note
Includes bibliographic references and author index
http://library.link/vocab/cover_art
https://contentcafe2.btol.com/ContentCafe/Jacket.aspx?Return=1&Type=S&Value=9780819440297&userID=ebsco-test&password=ebsco-test
Dimensions
28 cm.
http://library.link/vocab/discovery_link
{'f': 'http://opac.lib.rpi.edu/record=b1400496'}
Extent
xv, 818 p.
Isbn
9780819440297
Other physical details
ill. (some color)

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