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The Resource Dry thermal oxidation of silicon: Effects of surface cleaning and annealing on film characteristics as determined by ellipsometry

Dry thermal oxidation of silicon: Effects of surface cleaning and annealing on film characteristics as determined by ellipsometry

Label
Dry thermal oxidation of silicon: Effects of surface cleaning and annealing on film characteristics as determined by ellipsometry
Title
Dry thermal oxidation of silicon: Effects of surface cleaning and annealing on film characteristics as determined by ellipsometry
Creator
Contributor
Dissertation note
Thesis (master's)--Rensselaer Polytechnic Institute, December, 1990.
Dry thermal oxidation of silicon: Effects of surface cleaning and annealing on film characteristics as determined by ellipsometry
Label
Dry thermal oxidation of silicon: Effects of surface cleaning and annealing on film characteristics as determined by ellipsometry
Publication
Related Contributor
http://library.link/vocab/discovery_link
{'f': 'http://opac.lib.rpi.edu/record=b1211003'}
Extent
141 p.

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