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The Resource Dry processing for submicrometer lithography : 12-13 October 1989, Santa Clara, California, James Bondur, Alan R. Reinberg, chairs/editors ; sponsored by SPIE--The International Society for Optical Engineering ; cooperating organizations, SEMATECH, Center for Advanced Electronic Materials Processing/North Carolina State University, Engineering Research Center for Plasma-Aided Manufacturing/University of Wisconsin-Madison

Dry processing for submicrometer lithography : 12-13 October 1989, Santa Clara, California, James Bondur, Alan R. Reinberg, chairs/editors ; sponsored by SPIE--The International Society for Optical Engineering ; cooperating organizations, SEMATECH, Center for Advanced Electronic Materials Processing/North Carolina State University, Engineering Research Center for Plasma-Aided Manufacturing/University of Wisconsin-Madison

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Dry processing for submicrometer lithography : 12-13 October 1989, Santa Clara, California
Title
Dry processing for submicrometer lithography
Title remainder
12-13 October 1989, Santa Clara, California
Statement of responsibility
James Bondur, Alan R. Reinberg, chairs/editors ; sponsored by SPIE--The International Society for Optical Engineering ; cooperating organizations, SEMATECH, Center for Advanced Electronic Materials Processing/North Carolina State University, Engineering Research Center for Plasma-Aided Manufacturing/University of Wisconsin-Madison
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Series statement
Proceedings / SPIE--The International Society for Optical Engineering
Series volume
v. 1185
Dry processing for submicrometer lithography : 12-13 October 1989, Santa Clara, California, James Bondur, Alan R. Reinberg, chairs/editors ; sponsored by SPIE--The International Society for Optical Engineering ; cooperating organizations, SEMATECH, Center for Advanced Electronic Materials Processing/North Carolina State University, Engineering Research Center for Plasma-Aided Manufacturing/University of Wisconsin-Madison
Label
Dry processing for submicrometer lithography : 12-13 October 1989, Santa Clara, California, James Bondur, Alan R. Reinberg, chairs/editors ; sponsored by SPIE--The International Society for Optical Engineering ; cooperating organizations, SEMATECH, Center for Advanced Electronic Materials Processing/North Carolina State University, Engineering Research Center for Plasma-Aided Manufacturing/University of Wisconsin-Madison
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Bibliography note
Includes bibliographical references and index
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Dimensions
28 cm.
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{'f': 'http://opac.lib.rpi.edu/record=b1203559'}
Extent
vii, 307 p.
Isbn
9780819402219
Isbn Type
(pbk.)
Lccn
89-43521
Other physical details
ill.

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