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The Resource Chromium Doped TiO2 Sputtered Thin Films : Synthesis, Physical Investigations and Applications

Chromium Doped TiO2 Sputtered Thin Films : Synthesis, Physical Investigations and Applications

Label
Chromium Doped TiO2 Sputtered Thin Films : Synthesis, Physical Investigations and Applications
Title
Chromium Doped TiO2 Sputtered Thin Films
Title remainder
Synthesis, Physical Investigations and Applications
Creator
Contributor
Subject
Language
eng
Summary
This book presents co-sputtered processes ways to produce chrome doped TiO2 thin films onto various substrates such as quartz, silicon and porous silicon. Emphasis is given on the link between the experimental preparation and physical characterization in terms of Cr content. Moreover, the structural, optical and optoelectronic investigations are emphasized throughout. The book explores the potencial applications of devices based on Cr doped TiO2 thin films as gas sensors and in photocatalysis and in the photovoltaic industry. Also, this book provides extensive leads into research literature, and each chapter contains details which aim to develop awareness of the subject and the methods used. The content presented here will be useful for graduate students as well as researchers in materials science, physics, chemistry and engineering
Member of
Cataloging source
MiAaPQ
Literary form
non fiction
Nature of contents
dictionaries
Series statement
Manufacturing and Surface Engineering
Chromium Doped TiO2 Sputtered Thin Films : Synthesis, Physical Investigations and Applications
Label
Chromium Doped TiO2 Sputtered Thin Films : Synthesis, Physical Investigations and Applications
Link
http://libproxy.rpi.edu/login?url=https://ebookcentral.proquest.com/lib/rpi/detail.action?docID=1968619
Publication
Copyright
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Carrier category
online resource
Carrier category code
cr
Carrier MARC source
rdacarrier
Color
multicolored
Content category
text
Content type code
txt
Content type MARC source
rdacontent
Contents
  • Acknowledgments -- Contents -- Introduction -- Abstract -- 1 TiO2 Properties and Deposition Techniques -- Abstract -- 1.1 Introduction -- 1.2 Crystallographic, Electronics and Optics Structures of TiO2 -- 1.2.1 Crystallographic Properties of TiO2 [1] -- 1.2.2 Electronic Properties of TiO2 -- 1.2.3 Optical Properties of TiO2 -- 1.3 Implementation Technique of the TiO2 -- 1.3.1 Chemical Methods -- 1.3.2 Physical Method [Physical Vapor Deposition (PVD)] -- 1.4 Effect of Doping on the Optoelectronic and Microstructural Properties -- 1.5 TiO2 Thin Films and Their Various Applications -- 1.5.1 In the Photovoltaic Field -- 1.5.2 In the Gas Sensors Field -- 1.5.3 In the Photocatalysis Field -- 1.5.4 TiO2 Photocatalytic Operating Mode -- References -- 2 Synthesis and Characterization of TiO2-Cr Thin Films -- Abstract -- 2.1 Synthesis of Thin Films by Magnetron Sputtering -- 2.1.1 The Thin Film Formation Steps -- 2.1.1.1 Classification of the Growth Modes -- 2.1.1.2 The Morphology of Thin Films -- 2.1.2 Principle of Operation -- 2.1.2.1 Description of the Deposition Machine -- 2.1.2.2 Deposition Requirements for the Development of Cr-Doped TiO2 Thin Films -- 2.1.2.3 Drawbacks and Benefits -- 2.1.2.4 Conclusion -- 2.2 Electroetching -- 2.2.1 Cell Anodizing -- 2.2.2 Development of the PS Layers -- 2.3 Microstructural and Analytical Characterization -- 2.3.1 X-ray Photoelectron Spectroscopy (XPS) -- 2.3.2 Infrared Fourier Transform Spectroscopy (FTIR) -- 2.3.3 Grazing Incidence X-ray Diffraction (GIXRD) -- 2.3.4 X-ray Reflectometry (XRR) -- 2.3.5 Atomic Force Microscopy (AFM) -- 2.3.6 Scanning Electron Microscope (SEM) -- 2.3.7 Photoluminescence Setup -- 2.4 Electrical and Optoelectronic Characterizations -- 2.4.1 Test of Gas Sensors -- 2.4.2 Light Beam Induced Current Technique (LBIC) -- 2.4.3 Quantum Efficiency -- 2.5 Optical Characterisations
  • 2.5.1 UV-Visible Spectrometer -- 2.5.2 Ellipsometry -- 2.6 Conclusion -- References -- 3 Microstructure and Optical Properties of Pure and Cr-Doped TiO2 Thin Films -- Abstract -- 3.1 Introduction -- 3.2 Effect of Cr Concentration -- 3.2.1 Structural Properties -- 3.2.1.1 XPS Analysis of TiO2 Films -- 3.2.1.2 Analysis by X-ray Diffraction (XRD) -- 3.2.1.3 Analysis of the Film Density by X-ray Reflectometry -- 3.2.1.4 Analysis by Fourier Transform Infra-Red Spectroscopy (FTIR) -- 3.2.1.5 Raman Spectroscopy Analysis -- 3.2.1.6 Films Morphology: Analysis by Atomic Force Microscopy -- 3.2.1.7 Observation by Scanning Electron Microscopy (SEM) -- 3.2.2 Optical Properties -- 3.2.2.1 Optical Analysis by Ellipsometry -- 3.2.2.2 Analysis by UV-Visible Spectroscopy -- 3.3 Annealing Effect -- 3.3.1 Structural Properties -- 3.3.1.1 X-ray Diffraction -- 3.3.1.2 X-ray Reflectometry -- 3.3.1.3 Analysis by Fourier Transform Infrared Spectroscopy (FTIR) -- 3.3.1.4 Analysis by Raman Spectroscopy -- 3.3.1.5 Films Morphology: Analysis by Atomic Force Microscopy -- 3.3.1.6 Observation by Scanning Electron Microscopy (SEM) -- 3.3.2 Opticals Properties -- 3.3.2.1 Optical Analysis by Ellipsometry -- 3.3.2.2 Transmission -- 3.4 Conclusion -- References -- 4 Gas Sensors and Photo-Conversion Applications -- Abstract -- 4.1 Introduction -- 4.2 Detection Properties of Cr Doped TiO2 Films for Ethanol -- 4.2.1 Tests Under Ethanol -- 4.2.2 Electrical Characterizations Under Ethanol -- 4.2.3 Conductance Measurement -- 4.2.4 Sensitivity -- 4.2.5 The Response and Recovery Time Measurement -- 4.2.6 Effect of Cr Content on the Conductance Behavior -- 4.3 Nano-Composite TiO2Porous Si and Photoluminescence -- 4.3.1 Microstructural and Optoelectronic Analysis TiO2-CrSi-PorousSi Monocrystalline Films -- 4.3.1.1 Morphology of Layers: Analysis by Atomic Force Microscopy -- 4.3.1.2 Reflectivity
  • 4.3.1.3 Photoluminescence -- 4.3.1.4 LBIC Measurements -- 4.3.2 Microstructural and Optoelectronics Analysis of the TiO2-CrPorous Multicrystalline Si Films -- 4.3.2.1 Layers Morphology: Analysis by Atomic Force Microscopy -- 4.3.2.2 Layers Morphology: Analysis by Scanning Electron Microscope -- 4.3.2.3 Reflectivity -- 4.3.2.4 Lifetime -- 4.3.2.5 The Diffusion Length -- 4.3.2.6 Local Characterisation at the Level of the Grains Joint -- 4.4 Conclusion -- References -- 5 TiO2 Photocatalysis -- Abstract -- 5.1 Introduction -- 5.2 Part A: Photocatalytic Activity of Cr-Doped TiO2 Thin Films Deposited on PS Substrates -- 5.2.1 Microstructural Analysis of TiO2-CrPSc-Si -- 5.2.1.1 X-ray Diffraction -- 5.2.1.2 Photocatalytic Application -- 5.3 Part B: Photocatalytic Activity of Cr-Doped TiO2 Thin Films Deposited on Quartz Substrates -- 5.3.1 Optical Analysis TiO2-CrQuartz Substrate -- 5.3.1.1 Urbach Energy and Absorption Coefficient -- 5.3.1.2 Photocatalytic Application -- 5.4 Conclusion -- References -- Conclusion
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{'f': 'http://opac.lib.rpi.edu/record=b4382880'}
Extent
1 online resource (97 pages)
Form of item
online
Isbn
9783319133539
Media category
computer
Media MARC source
rdamedia
Media type code
c
Sound
unknown sound
Specific material designation
remote

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