Coverart for item
The Resource Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA, Francis M. Houlihan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH

Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA, Francis M. Houlihan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH

Label
Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA
Title
Advances in resist technology and processing XVIII
Title remainder
26-28 February, 2001, Santa Clara, [California] USA
Statement of responsibility
Francis M. Houlihan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH
Title variation
Advances in resist technology and processing 18
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
LHL
Illustrations
illustrations
Index
index present
Literary form
non fiction
Nature of contents
bibliography
Series statement
SPIE proceedings series
Series volume
v. 4345
Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA, Francis M. Houlihan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH
Label
Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA, Francis M. Houlihan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH
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Bibliography note
Includes bibliographic references and author index
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Dimensions
28 cm.
http://library.link/vocab/discovery_link
{'f': 'http://opac.lib.rpi.edu/record=b1400517'}
Extent
2 v.
Isbn
9780819440310
Other physical details
ill.

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