Coverart for item
The Resource Advances in resist technology and processing XXI : 23-24 February 2004, Santa Clara, California, USA, John L. Sturtevant, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMITECH

Advances in resist technology and processing XXI : 23-24 February 2004, Santa Clara, California, USA, John L. Sturtevant, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMITECH

Label
Advances in resist technology and processing XXI : 23-24 February 2004, Santa Clara, California, USA
Title
Advances in resist technology and processing XXI
Title remainder
23-24 February 2004, Santa Clara, California, USA
Statement of responsibility
John L. Sturtevant, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMITECH
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
LHL
Illustrations
illustrations
Index
index present
Literary form
non fiction
Nature of contents
bibliography
Series statement
SPIE proceedings series,
Series volume
v. 5376
Advances in resist technology and processing XXI : 23-24 February 2004, Santa Clara, California, USA, John L. Sturtevant, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMITECH
Label
Advances in resist technology and processing XXI : 23-24 February 2004, Santa Clara, California, USA, John L. Sturtevant, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMITECH
Publication
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Bibliography note
Includes bibliographical references and author index
http://library.link/vocab/cover_art
https://contentcafe2.btol.com/ContentCafe/Jacket.aspx?Return=1&Type=S&Value=9780819452894&userID=ebsco-test&password=ebsco-test
Dimensions
28 cm.
http://library.link/vocab/discovery_link
{'f': 'http://opac.lib.rpi.edu/record=b1634196'}
Extent
2 v. (xxxviii, 1288 p.)
Isbn
9780819452894
Other physical details
ill.

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