Coverart for item
The Resource Advances in resist technology and processing XVII : 28 February-1 March, 2000, Santa Clara, USA, Francis M. Houlihan, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International, International SEMATECH

Advances in resist technology and processing XVII : 28 February-1 March, 2000, Santa Clara, USA, Francis M. Houlihan, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International, International SEMATECH

Label
Advances in resist technology and processing XVII : 28 February-1 March, 2000, Santa Clara, USA
Title
Advances in resist technology and processing XVII
Title remainder
28 February-1 March, 2000, Santa Clara, USA
Statement of responsibility
Francis M. Houlihan, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International, International SEMATECH
Title variation
Advances in resist technology and processing 17
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
LHL
Illustrations
illustrations
Index
index present
Literary form
non fiction
Nature of contents
bibliography
Series statement
SPIE proceedings series
Series volume
v. 3999
Advances in resist technology and processing XVII : 28 February-1 March, 2000, Santa Clara, USA, Francis M. Houlihan, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International, International SEMATECH
Label
Advances in resist technology and processing XVII : 28 February-1 March, 2000, Santa Clara, USA, Francis M. Houlihan, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International, International SEMATECH
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Bibliography note
Includes bibliographic references and author index
http://library.link/vocab/cover_art
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Dimensions
28 cm.
http://library.link/vocab/discovery_link
{'f': 'http://opac.lib.rpi.edu/record=b1382171'}
Extent
2 v.
Isbn
9780819436177
Other physical details
ill.

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