Coverart for item
The Resource Advances in resist technology and processing XVI : Microlithography 1999 : 15-17 March, 1999, Santa Clara, California, Will Conley, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International

Advances in resist technology and processing XVI : Microlithography 1999 : 15-17 March, 1999, Santa Clara, California, Will Conley, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International

Label
Advances in resist technology and processing XVI : Microlithography 1999 : 15-17 March, 1999, Santa Clara, California
Title
Advances in resist technology and processing XVI
Title remainder
Microlithography 1999 : 15-17 March, 1999, Santa Clara, California
Statement of responsibility
Will Conley, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International
Title variation
  • Microlithography 1999
  • Advances in resist technology and processing 16
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
LHL
Illustrations
illustrations
Index
index present
Literary form
non fiction
Nature of contents
bibliography
Series statement
SPIE proceedings series,
Series volume
v. 3678
Advances in resist technology and processing XVI : Microlithography 1999 : 15-17 March, 1999, Santa Clara, California, Will Conley, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International
Label
Advances in resist technology and processing XVI : Microlithography 1999 : 15-17 March, 1999, Santa Clara, California, Will Conley, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International
Publication
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Bibliography note
Includes bibliographical references and author index
http://library.link/vocab/cover_art
https://contentcafe2.btol.com/ContentCafe/Jacket.aspx?Return=1&Type=S&Value=9780819431523&userID=ebsco-test&password=ebsco-test
Dimensions
28 cm.
http://library.link/vocab/discovery_link
{'f': 'http://opac.lib.rpi.edu/record=b1389232'}
Extent
2 v. (xv, 1402 p.)
Isbn
9780819431523
Other physical details
ill.

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