Coverart for item
The Resource Advances in resist technology and processing XIX : 4-6 March, 2002, Santa Clara, [California] USA, Theodore H. Fedynyshyn, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH

Advances in resist technology and processing XIX : 4-6 March, 2002, Santa Clara, [California] USA, Theodore H. Fedynyshyn, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH

Label
Advances in resist technology and processing XIX : 4-6 March, 2002, Santa Clara, [California] USA
Title
Advances in resist technology and processing XIX
Title remainder
4-6 March, 2002, Santa Clara, [California] USA
Statement of responsibility
Theodore H. Fedynyshyn, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
LHL
Illustrations
illustrations
Index
index present
Literary form
non fiction
Nature of contents
bibliography
Series statement
SPIE proceedings series
Series volume
v. 4690
Advances in resist technology and processing XIX : 4-6 March, 2002, Santa Clara, [California] USA, Theodore H. Fedynyshyn, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH
Label
Advances in resist technology and processing XIX : 4-6 March, 2002, Santa Clara, [California] USA, Theodore H. Fedynyshyn, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH
Publication
Related Contributor
Related Location
Related Agents
Related Authorities
Related Subjects
Related Items
Bibliography note
Includes bibliographic references and author index
http://library.link/vocab/cover_art
https://contentcafe2.btol.com/ContentCafe/Jacket.aspx?Return=1&Type=S&Value=9780819444363&userID=ebsco-test&password=ebsco-test
Dimensions
28 cm.
http://library.link/vocab/discovery_link
{'f': 'http://opac.lib.rpi.edu/record=b1480624'}
Extent
2 v.
Isbn
9780819444363
Lccn
2003268664
Other physical details
ill.

Library Locations

    • Folsom LibraryBorrow it
      110 8th St, Troy, NY, 12180, US
      42.729766 -73.682577
Processing Feedback ...