Coverart for item
The Resource Advances in resist technology and processing XI : 28 February-1 March 1994, San Jose, California, Omkaram Nalamasu, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International

Advances in resist technology and processing XI : 28 February-1 March 1994, San Jose, California, Omkaram Nalamasu, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International

Label
Advances in resist technology and processing XI : 28 February-1 March 1994, San Jose, California
Title
Advances in resist technology and processing XI
Title remainder
28 February-1 March 1994, San Jose, California
Statement of responsibility
Omkaram Nalamasu, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International
Title variation
Advances in resist technology and processing 11
Contributor
Subject
Genre
Member of
Series statement
Proceedings / SPIE--the International Society for Optical Engineering
Series volume
v. 2195
Advances in resist technology and processing XI : 28 February-1 March 1994, San Jose, California, Omkaram Nalamasu, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International
Label
Advances in resist technology and processing XI : 28 February-1 March 1994, San Jose, California, Omkaram Nalamasu, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International
Publication
Note
'... held in conjunction with SPIE's 1994 Symposium on Microlithography ...'--P. xiii
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Bibliography note
Includes bibliographical references and author index
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Dimensions
28 cm.
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{'f': 'http://opac.lib.rpi.edu/record=b1258246'}
Extent
xiii, 880 p.
Isbn
9780819414908
Lccn
94-65790
Other physical details
ill.

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