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The Resource Advances in resist technology and processing VI : 27 February-1 March 1989, San Jose, California, Elsa Reichmanis, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering

Advances in resist technology and processing VI : 27 February-1 March 1989, San Jose, California, Elsa Reichmanis, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering

Label
Advances in resist technology and processing VI : 27 February-1 March 1989, San Jose, California
Title
Advances in resist technology and processing VI
Title remainder
27 February-1 March 1989, San Jose, California
Statement of responsibility
Elsa Reichmanis, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering
Title variation
Advances in resist technology and processing 6
Contributor
Subject
Genre
Member of
Series statement
Proceedings of SPIE--the International Society for Optical Engineering
Series volume
v. 1086
Advances in resist technology and processing VI : 27 February-1 March 1989, San Jose, California, Elsa Reichmanis, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering
Label
Advances in resist technology and processing VI : 27 February-1 March 1989, San Jose, California, Elsa Reichmanis, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering
Publication
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Bibliography note
Includes bibliographical references and index
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Dimensions
28 cm.
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{'f': 'http://opac.lib.rpi.edu/record=b1184980'}
Extent
viii, 620 p.
Isbn
9780819401212
Isbn Type
(pbk.)
Lccn
89-60656
Other physical details
ill.

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