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The Resource Advances in resist technology and processing II : March 11-12, 1985, Santa Clara, California, Larry F. Thompson, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics

Advances in resist technology and processing II : March 11-12, 1985, Santa Clara, California, Larry F. Thompson, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics

Label
Advances in resist technology and processing II : March 11-12, 1985, Santa Clara, California
Title
Advances in resist technology and processing II
Title remainder
March 11-12, 1985, Santa Clara, California
Statement of responsibility
Larry F. Thompson, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics
Title variation
Advances in resist technology and processing 2
Contributor
Subject
Genre
Member of
Series statement
Proceedings of SPIE--the International Society for Optical Engineering
Series volume
v. 539
Advances in resist technology and processing II : March 11-12, 1985, Santa Clara, California, Larry F. Thompson, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics
Label
Advances in resist technology and processing II : March 11-12, 1985, Santa Clara, California, Larry F. Thompson, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics
Publication
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Bibliography note
Includes bibliographies and index
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Dimensions
28 cm.
http://library.link/vocab/discovery_link
{'f': 'http://opac.lib.rpi.edu/record=b1143892'}
Extent
vi, 350 p.
Isbn
9780892525744
Isbn Type
(pbk.)
Lccn
85-50710
Other physical details
ill.

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