Coverart for item
The Resource 21st Annual BACUS Symposium on Photomask Technology : 3-5 October, 2001 Monterey, [California] USA, Giang T. Dao, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Society for Optical Engineering ; published by SPIE--the International Society for Optical Engineering

21st Annual BACUS Symposium on Photomask Technology : 3-5 October, 2001 Monterey, [California] USA, Giang T. Dao, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Society for Optical Engineering ; published by SPIE--the International Society for Optical Engineering

Label
21st Annual BACUS Symposium on Photomask Technology : 3-5 October, 2001 Monterey, [California] USA
Title
21st Annual BACUS Symposium on Photomask Technology
Title remainder
3-5 October, 2001 Monterey, [California] USA
Statement of responsibility
Giang T. Dao, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Society for Optical Engineering ; published by SPIE--the International Society for Optical Engineering
Title variation
  • BACUS Symposium on Photomask Technology
  • Symposium on Photomask Technology and Management
  • Photomask technology
Creator
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
LHL
Illustrations
illustrations
Index
index present
Literary form
non fiction
Nature of contents
bibliography
Series statement
SPIE proceedings series
Series volume
v. 4562
21st Annual BACUS Symposium on Photomask Technology : 3-5 October, 2001 Monterey, [California] USA, Giang T. Dao, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Society for Optical Engineering ; published by SPIE--the International Society for Optical Engineering
Label
21st Annual BACUS Symposium on Photomask Technology : 3-5 October, 2001 Monterey, [California] USA, Giang T. Dao, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Society for Optical Engineering ; published by SPIE--the International Society for Optical Engineering
Publication
Note
Eighteenth conference entitled: Symposium on Photomask Technology and Management
Related Contributor
Related Location
Related Agents
Related Authorities
Related Subjects
Related Items
Bibliography note
Includes bibliographical references and author index
http://library.link/vocab/cover_art
https://contentcafe2.btol.com/ContentCafe/Jacket.aspx?Return=1&Type=S&Value=9780819442901&userID=ebsco-test&password=ebsco-test
Dimensions
28 cm.
http://library.link/vocab/discovery_link
{'f': 'http://opac.lib.rpi.edu/record=b1430567'}
Extent
2 v. (xvi, 1178 p.)
Isbn
9780819442901
Other physical details
ill.

Library Locations

    • Folsom LibraryBorrow it
      110 8th St, Troy, NY, 12180, US
      42.729766 -73.682577
Processing Feedback ...