Coverart for item
The Resource 17th Annual Symposium on Photomask Technology and Management : [proceedings] : 17-19 September, 1997, Redwood City, California, James A Reynolds, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology ; published by SPIE--the International Society for Optical Engineering

17th Annual Symposium on Photomask Technology and Management : [proceedings] : 17-19 September, 1997, Redwood City, California, James A Reynolds, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology ; published by SPIE--the International Society for Optical Engineering

Label
17th Annual Symposium on Photomask Technology and Management : [proceedings] : 17-19 September, 1997, Redwood City, California
Title
17th Annual Symposium on Photomask Technology and Management
Title remainder
[proceedings] : 17-19 September, 1997, Redwood City, California
Statement of responsibility
James A Reynolds, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology ; published by SPIE--the International Society for Optical Engineering
Title variation
  • Annual Symposium on Photomask Technology and Management
  • Photomask technology
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Subject
Genre
Language
eng
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Cataloging source
LHL
Illustrations
illustrations
Index
index present
Literary form
non fiction
Nature of contents
bibliography
Series statement
SPIE proceedings series
Series volume
v. 3236
17th Annual Symposium on Photomask Technology and Management : [proceedings] : 17-19 September, 1997, Redwood City, California, James A Reynolds, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology ; published by SPIE--the International Society for Optical Engineering
Label
17th Annual Symposium on Photomask Technology and Management : [proceedings] : 17-19 September, 1997, Redwood City, California, James A Reynolds, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology ; published by SPIE--the International Society for Optical Engineering
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Bibliography note
Includes bibliographical references and author index
http://library.link/vocab/cover_art
https://contentcafe2.btol.com/ContentCafe/Jacket.aspx?Return=1&Type=S&Value=9780819426697&userID=ebsco-test&password=ebsco-test
Dimensions
28 cm.
http://library.link/vocab/discovery_link
{'f': 'http://opac.lib.rpi.edu/record=b1350349'}
Extent
ix, 554 p.
Isbn
9780819426697
Other physical details
ill.

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